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Key terms: adhesion beam contact data file deep ultraviolet developer entire wafer etching exposed exposure exposure systems fabrication feature size gap immersion lithography lambda layer liquid lithography lithography wavelength mask minimum feature na nm numerical aperture onto the wafer optical optical lithography photo resist photolithography photomask photoresist plasma printing projection proximity resolution sheet sizes sodium spectrum spin coating substrate thickness ultraviolet uv wafer wafer surface wavelength wet Search external links cited by footnotes on Wikipedia page Photolithography: |
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